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原子层沉积 (ALD) 阀

世伟洛克® 原子层沉积 (ALD) 阀

世伟洛克超高纯原子层沉积 (ALD) 阀具有超高循环寿命、高速执行、流量、热浸没和超高洁净度,可在先进半导体制造应用中实现精确进料并尽可能地提高芯片产量。

索取 ALD 阀门信息

ALD 阀门问世以来,我们一直与半导体工具 OEM 和晶圆厂密切合作,提供的先进 ALD 阀门技术具有超高的精度、一致性、洁净度和高循环寿命,是紧跟市场快速创新步伐所必需的。世伟洛克® ALD 阀门可支持芯片生产效率的提高,并克服 ALD 工艺通常面临的挑战。

我们的 ALD 超高纯阀具有以下特点:

  • 快速动作下的超高循环寿命
  • Cv 范围从 0.27 至 1.7
  • 指定型号的承温能力高达 392°F (200°C)
  • 电子或光学执行机构位置传感选购件
  • 洁净度适合超高纯应用
  • 模块化表面安装、卡套管对焊和 VCR® 端接

了解 ALD 阀门如何应对挑战

原子层沉积 (ALD) 阀类别

超高纯度隔膜阀,ALD3 和 ALD6 系列

超高纯度隔膜阀,ALD3 和 ALD6 系列

ALD3 和 ALD6 隔膜阀在原子层沉积应用中具备强大的性能,可实现高速执行下的超高循环寿命。
超高纯度隔膜阀,ALD7 系列

超高纯度隔膜阀,ALD7 系列

世伟洛克® ALD7 超高纯隔膜阀提供了在半导体制造应用中尽可能地提高芯片成品率所需的精度和一致性。

高流量应用型超高纯度阀,ALD20 系列

高流量应用型超高纯度阀,ALD20 系列

使用 ALD20 超高纯阀门推进原子层沉积技术,其流速是其他 ALD 阀门的 2-3 倍。

Atomic Layer Deposition (ALD) Valve Catalogs

Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.

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One New Valve: Three Reasons It Could Change Semiconductor Manufacturing

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