Swagelok® Atomic Layer Deposition (ALD) Valves
Swagelok ultrahigh-purity atomic layer deposition (ALD) valves offer the ultrahigh cycle life, high-speed actuation, flow rates, thermal immersibility, and extreme cleanliness needed to enable precise dosing and maximize chip yield in advanced semiconductor manufacturing applications.
Request ALD Valve InformationSince introducing the world to ALD valves, we have worked closely with semiconductor tool OEMs and fabs to deliver advanced ALD valve technology that provides the extreme levels of precision, consistency, cleanliness, and high cycle life necessary to keep up with the quick pace of innovation in the marketplace. Swagelok® ALD valves can support increased chip production efficiency and overcome the challenges that are often associated with ALD processes.
Our ALD ultrahigh-purity valves feature:
- Ultrahigh cycle life with high-speed actuation
- Cv ranging from 0.27 to 1.7
- Temperature capability up to 392°F (200°C) for specified models
- Electronic or optical actuator position-sensing option
- Cleanliness suitability for ultrahigh-purity applications
- Modular surface mount, tube butt weld, and VCR® end connections
原子层沉积 (ALD) 阀类别
Atomic Layer Deposition (ALD) Valve Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
原子层沉积 (ALD) 隔膜阀，高速执行下的超高循环寿命 ，Cv 0.27 到 0.62，耐热执行器, 耐温高达 200°C（392°F），电子执行器位置传感选购件，合采用 316L VIM-VAR 不锈钢阀体的超高纯应用场合，VCR®, 卡套管对焊和模块化表面安装端接
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