
Swagelok® Ultrahigh-Purity Diaphragm Valves for Atomic Layer Processing (ALD3 and ALD6 Series)
Swagelok ALD3 and ALD6 series diaphragm valves are used in semiconductor manufacturing tools to achieve the controlled dosing necessary for atomic layer deposition (ALD) processing. They offer ultrahigh cycle life, high-speed actuation, and flow coefficients up to 0.62.
Request ALD Valve InformationUltrahigh-purity Swagelok® ALD3 and Swagelok® ALD6 diaphragm valves are designed to provide semiconductor manufacturers with dependable, high-speed dosing of precursor gases used to build up microchips layer by layer in deposition chambers. These high-performance ultrahigh-purity valves feature an ultrahigh cycle life, full immersibility at elevated temperatures, and suitability for ultrahigh-purity applications.
The diaphragms used in ALD3 and ALD6 valves are composed of a cobalt-based superalloy material that provides strength and corrosion resistance. Their valve bodies are 316L VIM-VAR stainless steel, making them suitable for ultrahigh-purity applications. The valve seats are made of fluorinated high-purity PFA to enable a broad range of chemical compatibility and resistance to swelling and contamination. These valves can be set up for normally closed and normally open pneumatic actuation, and they are available in a variety of configurations to suit different installation requirements.
See How ALD Valves Improve Semiconductor Manufacturing
ALD3 and ALD6 Valve Specifications
Working Pressure | Vacuum to 145 psig (10.0 bar) |
Burst Pressure | >3200 psig (220 bar) |
Actuation Pressure | 50 to 90 psig (3.5 to 6.2 bar) |
Temperature | 32° to 392°F (0° to 200°C) |
Flow Coefficient (Cv) | 0.27 or 0.62 |
Body Materials | 316L VIM-VAR stainless steel |
Diaphragm Material | Cobalt-based superalloy |
End Connections | Type (Size): Female VCR® face seal fitting (1/4 in. to 1/2 in.), male VCR face seal fitting (1/4 in. to 1/2 in.), modular surface mount high-flow C-seal (1.125 in. to 1.5 in.) |
Have questions about ALD valves?
ALD3 and ALD6 Series Valves Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
原子层沉积 (ALD) 隔膜阀,高速执行下的超高循环寿命 ,Cv 0.27 到 0.62,耐热执行器, 耐温高达 200°C(392°F),电子执行器位置传感选购件,合采用 316L VIM-VAR 不锈钢阀体的超高纯应用场合,VCR®, 卡套管对焊和模块化表面安装端接

Improve Semiconductor Yield with Optimized Alloys
Discover how semiconductor fabricators can improve end-to-end production yields and improve long-term profitability by selecting the right metals for critical fluid system components.
Learn About Material SelectionSwagelok Resources Curated for You

One New Valve: Three Reasons It Could Change Semiconductor Manufacturing
Find out how the latest innovation in atomic layer deposition (ALD) valve technology is changing the game for high-tech semiconductor manufacturers.

Q&A: Semiconductor Manufacturing Past, Present, and Future
Find out how collaboration between semiconductor tool OEMs, microchip manufacturers, and fluid system solutions providers has enabled the semiconductor market to keep up with the demands of Moore’s Law for decades, and where we go from here.

光纤设备制造商利用定制解决方案提高效率
自 20 世纪 80 年代以来,Rosendahl Nextrom 便与世伟洛克合作推动其业务的发展。了解有关使该公司超越其竞争对手并保持行业领先地位的解决方案的更多信息。

适合于科学前沿的可靠流体系统解决方案
了解为何芬兰稀释制冷机制造商 Bluefors 信赖世伟洛克提供的流体系统部件和解决方案,来助力于量子计算、实验物理学等领域。