Swagelok^® Atomic Layer Deposition (ALD) Valves

Since introducing the world to ALD valves, we have worked closely with semiconductor tool OEMs and fabricators to advance ALD dose control—helping customers keep pace with rapid innovation, accelerate development timelines, and improve chip yield in increasingly complex processes. Across our full portfolio, Swagelok^® ALD valves deliver the precision, consistency, cleanliness, and ultrahigh cycle life required to maintain stable performance in demanding applications.

Designed for tight flow control, fast actuation, and high-temperature stability, our valves reduce dose variability—supporting higher wafer yield and faster development cycles to help customers bring next-generation technologies to market faster.

Our ALD ultrahigh-purity valves feature:

• Ultrahigh cycle life with high-speed actuation
• Flow coefficients ranging from 0.27 C_v to 1.7 C_v
• Temperature capability up to 482°F (250°C) for specified models
• Field flow adjustability options available
• Electronic or optical actuator position-sensing option
• Suitable for ultrahigh-purity applications with 316L VIM-VAR stainless steel and alloy 22 body options
• Modular surface-mount, tube butt weld, and VCR^® end connections available
• Available in single body as well as additive manufactured (AM) manifold offerings

How the Right ALD Valve Can Improve Process Control