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超高纯隔膜阀,ALD7 系列

用于原子层沉积工艺的世伟洛克®超高纯隔膜阀(ALD7 系列)

世伟洛克 ALD7 超高纯阀提供了在新的或已有的半导体制造设备中,帮助尽可能地提高芯片产量所必需的流量一致性和流通能力、执行机构速度、温度等级和洁净度。

索取 ALD7 阀门信息

The Swagelok® ALD7 ultrahigh-purity diaphragm valve for atomic layer deposition (ALD) processing enables semiconductor tool manufacturers and chip fabricators to increase viable chip yields and enhances profitability by enabling the flow consistency and capacity, actuator speed, and performance at high temperatures necessary to overcome production processes limitations. It provides consistent performance from valve to valve, dose to dose, and chamber to chamber over an ultrahigh cycle life.

The Swagelok ALD7 valve:

  • Delivers quick, precise dosing over the course of millions of cycles in even the most demanding applications and features enhanced actuator technology with a response time as low as 5 ms
  • Is resistant to corrosive gases with a valve body comprised of proprietary ultrahigh-purity Swagelok 316L VIM-VAR stainless steel
  • Can be heated up to 200°C while keeping the pneumatic actuator below maximum operating temperature of 150°C
  • Delivers a flow coefficient (Cv) up to 0.7 (with optional custom (factory-set) versions available that deliver a flow coefficient of 0.5–0.7 Cv)
  • Maintains the same footprint as Swagelok industry-standard ALD valves and features an integrated thermal isolator to maximize limited space near the reaction chamber

See ALD7 Valves Up Close

ALD7 Valve Specifications

Working PressureVacuum to 145 psig (10.0 bar)
Burst Pressure>3200 psig (220 bar)
Actuation Pressure60 to 120 psig (4.1 to 8.27 bar)
Temperature RatingStandard valve body from 32°F (0°C) to 392°F (200°C)
Flow CoefficientStandard 0.7 Cv (factory set)
Body Materials316L VIM-VAR stainless steel
Diaphragm MaterialCobalt-based superalloy
End ConnectionsType: VCR® fittings, tube butt weld, 1.5 in. modular surface-mount high flow C-seal

Have questions about ALD valves?

Contact a Local Specialist

ALD7 系列阀门目录

查找详细的产品信息,包括结构材料、额定压力和温度、选购件及配件。

ALD 阀门和阀组

如何解决主要的 ALD 和 ALE 半导体工艺挑战

ALD 和 ALE 半导体生产工艺存在某些固有的挑战和复杂性。了解正确选择工艺阀如何帮助您克服这些问题。

选择合适的阀门应对 ALD 挑战

世伟洛克为您精心准备的产品、服务和解决方案

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了解为何芬兰稀释制冷机制造商 Bluefors 信赖世伟洛克提供的流体系统部件和解决方案,来助力于量子计算、实验物理学等领域。

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