Swagelok^® Ultrahigh-Purity Diaphragm Valves for Atomic Layer Processing (ALD3 and ALD6 Series)

Swagelok ALD3 and ALD6 series diaphragm valves are used in semiconductor manufacturing tools to achieve the controlled dosing necessary for atomic layer deposition (ALD) processing. They offer ultrahigh cycle life, high-speed actuation, and flow coefficients up to 0.62.

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Ultrahigh-purity Swagelok^® ALD3 and Swagelok^® ALD6 diaphragm valves are designed to provide semiconductor manufacturers with dependable, high-speed dosing of precursor gases used to build up microchips layer by layer in deposition chambers. These high-performance ultrahigh-purity valves feature an ultrahigh cycle life, full immersibility at elevated temperatures, and suitability for ultrahigh-purity applications.

The diaphragms used in ALD3 and ALD6 valves are composed of a cobalt-based superalloy material that provides strength and corrosion resistance. Their valve bodies are 316L VIM-VAR stainless steel, making them suitable for ultrahigh-purity applications. The valve seats are made of fluorinated high-purity PFA to enable a broad range of chemical compatibility and resistance to swelling and contamination. These valves can be set up for normally closed and normally open pneumatic actuation, and they are available in a variety of configurations to suit different installation requirements.

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ALD3 and ALD6 Valve Specifications

Working Pressure	Vacuum to 145 psig (10.0 bar)
Burst Pressure	>3200 psig (220 bar)
Actuation Pressure	50 to 90 psig (3.5 to 6.2 bar)
Temperature	32° to 392°F (0° to 200°C)
Flow Coefficient (C_v)	0.27 or 0.62
Body Materials	316L VIM-VAR stainless steel
Diaphragm Material	Cobalt-based superalloy
End Connections	Type (Size): Female VCR^® face seal fitting (1/4 in. to 1/2 in.), male VCR face seal fitting (1/4 in. to 1/2 in.), modular surface mount high-flow C-seal (1.125 in. to 1.5 in.)

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ALD3 and ALD6 Series Valves Catalogs

Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.

隔膜阀：原子层沉积用ALD

原子层沉积 (ALD) 隔膜阀，高速执行下的超高循环寿命，Cv 0.27 到 0.62，耐热执行器, 耐温高达 200°C（392°F），电子执行器位置传感选购件，合采用 316L VIM-VAR 不锈钢阀体的超高纯应用场合，VCR®, 卡套管对焊和模块化表面安装端接

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