世伟洛克® 原子层沉积 (ALD) 阀
世伟洛克超高纯原子层沉积 (ALD) 阀具有超高循环寿命、高速执行、流量、热浸没和超高洁净度，可在先进半导体制造应用中实现精确进料并尽可能地提高芯片产量。
索取 ALD 阀门信息Since introducing the world to ALD valves, we have worked closely with semiconductor tool OEMs and fabricators to advance ALD dose control—helping customers keep pace with rapid innovation, accelerate development timelines, and improve chip yield in increasingly complex processes. Across our full portfolio, Swagelok® ALD valves deliver the precision, consistency, cleanliness, and ultrahigh cycle life required to maintain stable performance in demanding applications.
Designed for tight flow control, fast actuation, and high-temperature stability, our valves reduce dose variability—supporting higher wafer yield and faster development cycles to help customers bring next-generation technologies to market faster.
Our ALD ultrahigh-purity valves feature:
- Ultrahigh cycle life with high-speed actuation
- Flow coefficients ranging from 0.27 Cv to 1.7 Cv
- Temperature capability up to 482°F (250°C) for specified models
- Field flow adjustability options available
- Electronic or optical actuator position-sensing option
- Suitable for ultrahigh-purity applications with 316L VIM-VAR stainless steel and alloy 22 body options
- Modular surface-mount, tube butt weld, and VCR® end connections available
- Available in single body as well as additive manufactured (AM) manifold offerings
Atomic Layer Deposition (ALD) Valves Categories
Ultrahigh-Purity Diaphragm Valves, ALD3 and ALD6 Series
ALD3 and ALD6 diaphragm valves offer ultrahigh cycle life, high-speed actuation, and strong performance in atomic layer deposition applications.
Ultrahigh-Purity Diaphragm Valves, ALD7A Series
The Swagelok ALD7A ultrahigh-purity diaphragm valve offers the precision and consistency needed to maximize chip yields in semiconductor manufacturing applications.
Ultrahigh-Purity Diaphragm Valves, ALD7C Series
Swagelok ALD7C ultrahigh-purity diaphragm valves deliver performance, speed, and reliability in the most advanced ALD applications.
Ultrahigh-Purity Valves for High-Flow Applications, ALD20 Series
Advance atomic layer deposition technology with flow rates 2–3x higher than other ALD valves with the ALD20 ultrahigh-purity valve.
Atomic Layer Deposition (ALD) Valve Catalogs
Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.
ALD3, ALD6, ALD7A, and ALD7C Diaphragm Valves and ALD20 Bellows: Ultrahigh cycle life, high-speed actuation; Up to 482°F (250°C) w thermal actuators; Electronic actuator position-sensing; ultrahigh-purity applications; High flow capacity, PFA seat, Normally closed pneumatic actuation, Alloy 22 available
Deploying New Precursors with Optimized Valves
Next-generation semiconductor precursors pose new challenges in manufacturing. Optimized system design and ALD valve technology can help you stay ahead.
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