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超高纯隔膜阀,ALD3 和 ALD6 系列

用于原子层沉积工艺的世伟洛克®超高纯隔膜阀(ALD3 和 ALD6 系列)

世伟洛克 ALD3 和 ALD6 系列隔膜阀用于半导体制造设备,以实现原子层沉积 (ALD) 处理所需的可控计量。它们具有超高循环寿命、快速驱动和高达 0.62 的流量系数。

索取 ALD 阀门信息

Ultrahigh-purity Swagelok® ALD3 and Swagelok® ALD6 diaphragm valves are designed to provide semiconductor manufacturers with dependable, high-speed dosing of precursor gases used to build up microchips layer by layer in deposition chambers. These high-performance ultrahigh-purity valves feature an ultrahigh cycle life, full immersibility at elevated temperatures, and suitability for ultrahigh-purity applications.

The diaphragms used in ALD3 and ALD6 valves are composed of a cobalt-based superalloy material that provides strength and corrosion resistance. Their valve bodies are 316L VIM-VAR stainless steel, making them suitable for ultrahigh-purity applications. The valve seats are made of fluorinated high-purity PFA to enable a broad range of chemical compatibility and resistance to swelling and contamination. These valves can be set up for normally closed and normally open pneumatic actuation, and they are available in a variety of configurations to suit different installation requirements.

See How ALD Valves Improve Semiconductor Manufacturing

ALD3 and ALD6 Valve Specifications

Working PressureVacuum to 145 psig (10.0 bar)
Burst Pressure>3200 psig (220 bar)
Actuation Pressure50 to 90 psig (3.5 to 6.2 bar)
Temperature32° to 392°F (0° to 200°C)
Flow Coefficient (Cv)0.27 or 0.62
Body Materials316L VIM-VAR stainless steel
Diaphragm MaterialCobalt-based superalloy
End ConnectionsType (Size): Female VCR® face seal fitting (1/4 in. to 1/2 in.), male VCR face seal fitting (1/4 in. to 1/2 in.), modular surface mount high-flow C-seal (1.125 in. to 1.5 in.)

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ALD3 and ALD6 Series Valves Catalogs

Locate detailed product information, including materials of construction, pressure and temperature ratings, options, and accessories.

世伟洛克流体系统部件采用在半导体制造环境中能够持久应用的材料。

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了解材料选择

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